Microstructural analysis of N-polar InGaN directly grown on a ScAlMgO<sub>4</sub>(0001) substrate
نویسندگان
چکیده
Abstract We report the characterization of a N-polar InGaN layer deposited by metalorganic vapor-phase epitaxy on ScAlMgO 4 (0001) (SAM) substrate without low-temperature buffer layer. The was tensile-strained, and its stoichiometry corresponded to In 0.13 Ga 0.87 N. also present microstructural observation InGaN/SAM interface via integrated differential phase contrast-scanning transmission electron microscopy. results show that between SAM occurs O atoms O–Sc surface (Ga,In) InGaN.
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ژورنال
عنوان ژورنال: Applied Physics Express
سال: 2022
ISSN: ['1882-0786', '1882-0778']
DOI: https://doi.org/10.35848/1882-0786/ac6c1a